Electron beam evaporation (EBE) is a physical vapor deposition (PVD) technique for thin film deposition. During electron beam evaporation, a beam of high-energy electrons is used to heat and vaporize solid material, which then condenses on a substrate to form a thin film. Tungsten and molybdenum crucibles are often used in electron beam evaporation processes due to their excellent thermal and mechanical properties. Tungsten/molybdenum crucibles are commonly used for thin film deposition in microelectronics production, such as integrated circuits (ICs) and microprocessors; optical coating processes for depositing thin films on lenses, mirrors or other optical components; thin film deposition of anti-reflective coatings or conductive layers; wear-resistant coatings: tungsten crucibles can be used to deposit wear-resistant coatings on various components such as cutting tools or engine parts.
Technical Specifications
Outer diameter and height 30*15mm, 34*20mm, 35*17mm 40*17mm, 42*19mm, 45*22mm, 50mm*22mm
The crucibles we display are available in different sizes and can also be customized upon request.
Advantages
Extremely high melting point; suitable for processing high melting point materials. High thermal conductivity for efficient heat transfer during evaporation.
High purity; using tungsten crucibles helps ensure the purity of deposited films.
High mechanical strength; tungsten is known for its excellent mechanical strength and resistance to deformation at high temperatures.
Low vapor pressure; tungsten has a low vapor pressure, which helps minimize contamination and maintain a clean vacuum environment during evaporation.